Maintenance Notice (3:15 - 7:30 AM February 22, 2025 UTC): This website is scheduled to be unavailable due to maintenance. We appreciate your patience and understanding.
Notice of Discontinuing the Use of Password-Protected Compressed Files | Product Document Searching Made Easy by 2D Code! | TCI Life Science News February 2025 | [Product Highlights] Chemiluminescent Reagents for... | Various analytical charts can be searched on each product detail page and Product Document Search (The kinds of analytical charts differ by product)
Maximum quantity allowed is 999
Please select the quantity
Fabrication and Evaluation of Organic Field-Effect Transistors (OFETs) : Ph-BTBT-10
2-Decyl-7-phenyl[1]benzothieno[3,2-b][1]benzothiophene
[for organic electronics]
Ph-BTBT-10
CAS RN: 1398395-83-9
Product Number: D5491
Performance of Ph-BTBT-10 [D5491]-based OFETs
Table. OFETs Characteristics of Ph-BTBT-10 [D5491]-based OFETs
Entry | Fabrication Method | Device Configuration | SAM Treatment | Tsub(°C) | Annealing Temp.a(°C) | Polarity | μ (cm2 V−1 s−1) | Vth (V) | Ion/Ioff |
---|---|---|---|---|---|---|---|---|---|
Entry1 | Fabrication MethodVacuum deposition | Device ConfigurationTCBG | SAM Treatmentw/o Bare |
Tsub(°C)60 | Annealing Temp.a(°C)120 | Polarityp | μ (cm2 V−1 s−1)6.1 | Vth (V)‒12 | Ion/Ioff106 |
Entry2 | Fabrication MethodVacuum deposition | Device ConfigurationTCBG | SAM TreatmentODTS | Tsub(°C)60 | Annealing Temp.a(°C)120 | Polarityp | μ (cm2 V−1 s−1)12.0 | Vth (V)‒22 | Ion/Ioff107 |
![Figure. Transfer curves in the saturated region](/assets/cms-images/D5491-transfer-curves-en.png)
Figure. Transfer curves in the saturated region
Experimental details
Fabrication and evaluation of vacuum-deposited Ph-BTBT-10 [D5491]-based OFETs
< Substrate>
< Self-Assembly Monolayer (SAM) Treatment>
< Vacuum Deposition>
< Post-Annealing Treatment>
< Device configuration>
< Evaluation condition>
< Substrate>
- Bare Si/SiO2 (thickness of SiO2: 200 nm)
- ODTS-treated Si/SiO2 (thickness of SiO2: 200 nm)
< Self-Assembly Monolayer (SAM) Treatment>
- n-Octyltrichlorosilane (ODTS) [T3815]
- Piranha etching (H2SO4:H2O2=4:1, 80ºC, 2h)
- Ultrasonication (Deionized water, Acetone, IPA, 10 min each)
- Exposure to vapor (IPA, 3 min)
- UV/O3 treatment (1 h)
- Immersion in ODTS solution (0.01 M toluene, 16 h, N2)
- Ultrasonication (Toluene, Acetone, IPA, 10 min each)
< Vacuum Deposition>
- Deposition rate of Ph-BTBT-10 [D5491] 0.1 Å/s (under a pressure of∼10−5 Pa)
- Substrate temperature during deposition: 60 °C
- Deposition rate of Au: 0.2 Å/s (under a pressure of∼10−5 Pa)
< Post-Annealing Treatment>
- Annealing condition: 120 ºC, 5 min, N2
< Device configuration>
- [n+-Si/SiO2 (200 nm) / Ph-BTBT-10 [D5491] (40 nm) / Au (40 nm)]
- Top-Contact Bottom-Gate Type (TCBG)
- Channel Length: 50 μm
- Channel width: 1.5 mm
< Evaluation condition>
- Under N2
- Field-effect mobilities (μ) were determined from the transfer curves in the saturation regime using the following equation:
ID = (W/2L) μ Ci (VG − Vth)2