Photoreactive Crosslinker to Form Polymer Thin Film Transistor by Solution Process

4-Azido-2,3,5,6-tetrafluorobenzoic acid (1) is used as a photoreactive crosslinker in material science and life science. The photoreactive molecule derived from 1 generates a nitrene moiety by UV irradiation and forms a covalent bond to the target compound.¹⁾
In general, organic electronic devices are unstable under heat and high-pressure conditions, therefore a method to manufacture devices under simple and mild conditions has been desired.^2,3) By the way, Cho et al. reported that a photoreactive cross linker 4Bx with a moiety of 1 fabricates polymer thin film transistors by solution process.⁴⁾ 4Bx was miscible with the electronic material, and the electronic material was able to be held on the substrate under mild conditions by UV irradiation. They also used this technique to create thin film patterns of semiconductors, gate insulators, and conductors. The electronic component layer has high durability to solvents and can be laminated. So the development of thin film transistors by solution process using photoreactive crosslinkers is expected.