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Fabrication and Evaluation of Organic Field-Effect Transistors (OFETs) : P3HT
Poly(3-hexylthiophene-2,5-diyl) (regioregular)
P3HT
CAS RN: 125321-66-6
Product Number: P2513
Performance of P3HT (regioregular) [P2513]-based OFETs
Table. OFETs Characteristics of P3HT (regioregular) [P2513]
Entry | Fabrication Method | Device Configuration | SAM Treatment | Annealing Temp.a (°C) | Polarity | μ (cm2 V−1 s−1) | Vth (V) | Ion/Ioff |
---|---|---|---|---|---|---|---|---|
Entry1 | Fabrication MethodSpin-coating | Device ConfigurationTCBG | SAM TreatmentOTS | Annealing Temp.a (°C)100 | Polarityp | μ (cm2 V−1 s−1)0.12 | Vth (V)9.9 | Ion/Ioff103 |
Figure. Transfer curves in the saturated region
Experimental details
Fabrication and evaluation of spin-coated P3HT (regioregular) [P2513]-based OFETs
< Substrate >
< Self-Assembly Monolayer (SAM) Treatment >
< Spin-Coating >
< Vacuum Deposition >
< Post-Annealing Treatment >
< Device Configuration >
< Evaluation Condition >
< Substrate >
- OTS-treated Si/SiO2 (thickness of SiO2:300 nm)
< Self-Assembly Monolayer (SAM) Treatment >
- n-Octyltrichlorosilane (OTS) [O0168]
- Piranha etching (H2SO4:H2O2=4:1, 80ºC, 2h)
- Ultrasonication (Deionized water, Acetone, IPA, 10 min each)
- Exposure to vapor (IPA, 3 min)
- UV/O3 treatment (1 h)
- Immersion in OTS solution (0.01 M toluene, 16 h, N2)
- Ultrasonication (Toluene, Acetone, IPA, 10 min each)
< Spin-Coating >
- P3HT (regioregular) [P2513] 10 mg/ml, 1,2,4-Trichlorobenzene:Chloroform (2:98) mixed solvent
- Spin-coating condition: 1500 RPM, 60 sec, N2
< Vacuum Deposition >
- Deposition rate of Au: 0.2 Å/s (under a pressure of∼10−4 Pa)
< Post-Annealing Treatment >
- Annealing condition: 100 ºC, 30 min, N2
< Device Configuration >
- [n+-Si/SiO (300 nm) / P3HT (regioregular) [P2513] (100 nm) / Au (40 nm)]
- Bottom-Contact Bottom-Gate Type (TCBG)
- Channel Length: 50 μm
- Channel width: 1.5 mm
< Evaluation Condition >
- Under N2
- Field-effect mobilities (μ) were determined from the transfer curves in the saturation regime using the following equation:
ID = (W/2L) μ Ci (VG − Vth)2