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CAS RN: 86233-74-1 | Product Number: C2610
Copper(I) Hexafluoro-2,4-pentanedionate 1,5-Cyclooctadiene Complex
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Purity: >95.0%(T)
Synonyms:
- 1,5-Cyclooctadiene(hexafluoro-2,4-pentanedionato)copper(I)
Product Documents:
| Size | Unit Price | Same Day | 2-3 Business Days | Other Lead Time |
Shipping Information
|
|---|---|---|---|---|---|
| 1G |
$119.00
|
0 | 0 | It can be shipped in about 2 weeks after ordering | |
| 5G |
$417.00
|
1 | 0 | It can be shipped in about 2 weeks after ordering |
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| Product Number | C2610 |
| Purity / Analysis Method | >95.0%(T) |
| Molecular Formula / Molecular Weight | C__1__3H__1__3CuF__6O__2 = 378.78 |
| Physical State (20 deg.C) | Solid |
| Storage Temperature | Refrigerated (0-10°C) |
| Store Under Inert Gas | Store under inert gas |
| Condition to Avoid | Air Sensitive,Heat Sensitive |
| Packaging and Container | 1G-Glass Bottle with Plastic Insert (View image) |
| CAS RN | 86233-74-1 |
| Reaxys Registry Number | 16594364 |
| PubChem Substance ID | 253659579 |
| MDL Number | MFCD00156517 |
Specifications
| Appearance | Light yellow to Yellow to Green powder to crystal |
| Purity(Chelometric Titration) | min. 95.0 % |
Properties (reference)
| Melting Point | 100 °C |
GHS
Related Laws:
Transport Information:
| H.S.code* | 2914.79-000 |
Application
Preparation of copper films by chemical vapor deposition (CVD)
References
- Mechanisms of copper chemical vapor deposition
- Chemical vapor deposition of copper from 1,5-cyclooctadiene copper(I) hexafluoroacetylacetonate
- Chemical vapor deposition of copper via disproportionation of hexafluoroacetylacetonato (1,5-cyclooctadiene)copper(I), (hfac)Cu(1,5-COD)
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