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CAS RN: 1346753-09-0 | Product Number: O0396
2-(9-Oxoxanthen-2-yl)propionic Acid 1,5,7-Triazabicyclo[4.4.0]dec-5-ene Salt
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![2-(9-Oxoxanthen-2-yl)propionic Acid 1,5,7-Triazabicyclo[4.4.0]dec-5-ene Salt](/_ui/responsive/theme-tci/images/missing_product_zoom.jpg "2-(9-Oxoxanthen-2-yl)propionic Acid 1,5,7-Triazabicyclo[4.4.0]dec-5-ene Salt")
Purity: >98.0%(HPLC)
Synonyms:
Product Documents:
| Size | Unit Price | Hyderabad | Japan* | Quantity |
|---|---|---|---|---|
| 1G |
₹10,200.00
|
1 | ≥80 |
|
*Upon orders receipt, Hyderabad stocks will be dispatched on the same day.
*Items available in Japan warehouse will be dispatched in 10-12 working days.
*INR price is exclusive of domestic taxes applicable.
*TCI frequently reviews storage conditions to optimize them. Please note that the latest information on the storage temperature for the products is described on our website.
| Product Number | O0396 |
| Purity / Analysis Method | >98.0%(HPLC) |
| Molecular Formula / Molecular Weight | C__2__3H__2__5N__3O__4 = 407.47 |
| Physical State (20 deg.C) | Solid |
| Storage Temperature | Room Temperature (Recommended in a cool and dark place, <15°C) |
| CAS RN | 1346753-09-0 |
| PubChem Substance ID | 253659600 |
Specifications
| Appearance | White to Almost white powder to crystal |
| Purity(HPLC) | min. 98.0 %(total of Ion-Pair) |
Properties (reference)
GHS
| Pictogram |
|
| Signal Word | Warning |
| Hazard Statements | H315 : Causes skin irritation. H319 : Causes serious eye irritation. |
| Precautionary Statements | P264 : Wash skin thoroughly after handling. P280 : Wear protective gloves/ eye protection/ face protection. P302 + P352 : IF ON SKIN: Wash with plenty of water. P337 + P313 : If eye irritation persists: Get medical advice/ attention. P305 + P351 + P338 : IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. P362 + P364 : Take off contaminated clothing and wash it before reuse. P332 + P313 : If skin irritation occurs: Get medical advice/ attention. |
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Application
Photobase Generator (PBG) for Anionic UV Light Curing
References
- K. Arimitsu, Yuki Gosei Kagaku Kyokaishi (J. Syn. Org. Chem., Jpn.) 2012, 70, 508.
- K. Arimitsu, R. Endo, Chem. Mater. 2013, 25, 4461.
- K. Arimitsu, Tokyo University of Science, Jpn. Kokai Tokkyo Koho 2011 236416, 2011.
- K. Arimitsu, Tokyo University of Science, Jpn. Kokai Tokkyo Koho 2012 237776, 2012.
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