A photopolymer is a photosensitive, optically functional polymer material or resin whose properties, such as solubility, are altered by light irradiation. Photopolymers are widely used as photoresist materials during etching in the manufacture of printed circuits and semiconductor integrated circuits. In positive-type photoresist, photoacid generators (PAG) change the solubility of the photopolymer, whereas negative-type photoresist requires photopolymerization initiators for polymerization and curing. This section includes the monomers required to generate photopolymers.
Please also check Photopolymerization initiators.
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| 产品编码 | H1689 |
| CAS RN | 115372-36-6 |
| 纯度/分析方法 | >99.0%(GC) |
![2-[(3r,5r,7r)-Adamantan-1-yl]propan-2-yl Methacrylate (stabilized with MEHQ)](/medias/Tci-300-A3633.jpg?context=bWFzdGVyfHJvb3R8MTY3MDZ8aW1hZ2UvanBlZ3xhR1F4TDJobE9DODVORFk1T0RJd01qY3lOamN3TDFSamFTMHpNREJmUVRNMk16TXVhbkJufDU2MTE0MDFiNGYzNzExZGViNzcwNDBkNDI5OTdhNWRlZWVlNjQ3MTViMzI1YmUxZjc3ODNmZjU2ZTMxM2E1Y2U "2-[(3r,5r,7r)-Adamantan-1-yl]propan-2-yl Methacrylate (stabilized with MEHQ)")
| 产品编码 | A3633 |
| CAS RN | 279218-76-7 |
| 纯度/分析方法 | >98.0%(GC) |
| 产品编码 | E1407 |
| CAS RN | 274248-09-8 |
| 纯度/分析方法 | >98.0%(GC) |
| 产品编码 | M0326 |
| CAS RN | 585-07-9 |
| 纯度/分析方法 | >98.0%(GC) |
| 产品编码 | M1526 |
| CAS RN | 16887-36-8 |
| 纯度/分析方法 | >98.0%(GC) |
| 产品编码 | M3223 |
| CAS RN | 249562-06-9 |
| 纯度/分析方法 | >98.0%(GC) |
| 产品编码 | M3228 |
| CAS RN | 178889-45-7 |
| 纯度/分析方法 | >98.0%(GC) |
| 产品编码 | M3261 |
| CAS RN | 178889-49-1 |
| 纯度/分析方法 | >98.0%(GC) |
| 产品编码 | M3676 |
| CAS RN | 1149760-04-2 |
| 纯度/分析方法 | >98.0%(GC) |
产品编码: H1689 |
纯度/分析方法
>99.0%(GC)
产品编码: A3633 |
纯度/分析方法
>98.0%(GC)
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