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Fabrication and Evaluation of Organic Field-Effect Transistors (OFETs) : [60]PCBM
[6,6]-Phenyl-C61-butyric Acid Methyl Ester
[for organic electronics]
[60]PCBM
CAS RN: 115383-22-7
Product Number: P2682
Performance of [60]PCBM [P2682]-based OFETs
Table. OFETs Characteristics of [60]PCBM [P2682]-based OFETs
Entry | Fabrication Method | Device Configuration | SAM Treatment | Tsub(°C) | Polarity | μ (cm2 V−1 s−1) | Vth (V) | Ion/Ioff |
---|---|---|---|---|---|---|---|---|
Entry1 | Fabrication MethodSpin-coating | Device ConfigurationTCBG | SAM TreatmentHMDS | Tsub(°C)RT | Polarityn | μ (cm2 V−1 s−1)2.4 × 10-2 | Vth (V)6.7 | Ion/Ioff104 |
Figure. Transfer curves in the saturated region
Experimental details
Fabrication and evaluation of spin-coated [60]PCBM [P2682]-based OFETs
< Substrate>
< Self-Assembly Monolayer (SAM) Treatment>
< Spin-Coating>
< Vacuum Deposition>
< Device configuration>
< Evaluation condition>
< Substrate>
- HMDS-treated Si/SiO2 (thickness of SiO2: 200 nm)
< Self-Assembly Monolayer (SAM) Treatment>
- 1,1,1,3,3,3-Hexamethyldisilazane (HMDS) [H0089]
- Piranha etching (H2SO4:H2O2=4:1, 80ºC, 2h)
- Ultrasonication (Deionized water, Acetone, IPA, 10 min each)
- Exposure to vapor (IPA, 3 min)
- UV/O3 treatment (1 h)
- Immersion in HMDS (16 h, N2)
- Ultrasonication (Toluene, Acetone, IPA, 10 min each)
< Spin-Coating>
- [60]PCBM [P2682], 15 mg/ml, Chloroform
- Spin-coating condition: 3000 RPM, 60 sec, N2
< Vacuum Deposition>
- Deposition rate of Au: 0.2 Å/s (under a pressure of∼10−4 Pa)
< Device configuration>
- [n+-Si/SiO2 (200 nm) / [60]PCBM [P2682] / Au (40 nm)]
- Top-Contact Bottom-Gate Type (TCBG)
- Channel Length: 50 μm
- Channel width: 1.5 mm
< Evaluation condition>
- Under N2
- Field-effect mobilities (μ) were determined from the transfer curves in the saturation regime using the following equation:ID = (W/2L) μ Ci (VG − Vth)2